Carbon tetrafluoride (CF₄) is a fluorine-containing compound with stable chemical properties. It remains in the atmosphere for up to 50,000 years, has a high greenhouse effect, and is environmentally unfriendly. Hydrocarbon products can be used as alternatives to CF₄.
CF₄ is used as a plasma etching gas in the fabrication of fine circuits on thin film materials such as silicon, silicon dioxide, and silicon nitride. Its extremely low boiling point (-128°C) makes it suitable for superconducting research, cryogenic surgery, and cooling infrared detection equipment. It is also used as a protective gas in metal smelting (such as aluminum and stainless steel) and as a synthetic additive in the plastics industry.
CF₄ is non-toxic and non-flammable, but high concentrations can reduce the oxygen partial pressure and cause asphyxiation (symptoms include dizziness and coma). CF₄ should be stored away from heat sources (storage temperature ≤ 30°C) and avoid mixing with flammable materials and oxidizers. CF₄ in cylinders must be protected with a rubber ring to prevent physical impact.
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