Tetrafluoromethane, also known as carbon tetrafluoride, is a non-flammable gas, but in hot weather, the pressure in the container increases, and there is a risk of cracking or explosion. If there is a fire, spray water to cool the container down, and if possible, move the container to an open area. The main use of carbon tetrafluoride is as a low-temperature refrigerant and plasma dry etching technology for integrated circuits. Usually it is packaged and transported in steel cylinders.
The downstream products of tetrafluoromethane are silicon film materials, silicon dioxide film materials, silicon nitride film materials, phosphorus silicon glass film materials, tungsten film materials and other film materials, electronic device surface cleaning agents, solar cells, detergents, lubricants, brake fluids, and safe self-explosion explosion-proof dry powder fire extinguishers.
There are currently four methods for the synthesis of tetrafluoromethane CF4, including direct fluorination of alkanes, fluorination of chlorofluoromethane, fluorination of hydrofluoromethane, and direct synthesis of fluorocarbons. Direct fluorination of alkanes is the earliest method used in industry to prepare fluoroalkanes, but the reaction is highly exothermic and difficult to control, and special measures need to be taken.
Normally, tetrafluoromethane should be placed in a cool and ventilated environment, away from flammable items, and the storage temperature should not exceed 30 degrees, and it should be stored separately from oxidants. Perfluoromethane represented by CF4 is widely used as plasma etching gas in the microelectronics industry, and the global demand is growing, and the market prospects are good.
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