Technological Advantages
- Controllable purity: Graphite impurities can be reduced by adjusting methane concentration and gas ratio.
- Large-area growth: Diamond thin films can be grown on non-diamond substrates (such as silicon and metals).
- Energy-efficient and environmentally friendly: Compared to the high-pressure high-temperature (HPHT) method, the CVD method consumes less energy and can use renewable energy sources to produce methane.
Challenges and Improvements
- Growth rate: Traditional CVD methods have a slow growth rate (several micrometers per hour), requiring optimization of plasma technology and gas dynamics.
- Defect control: High concentrations of methane may lead to amorphous carbon or grain boundary defects, requiring precise control of process parameters.
- Cost issues: High-purity methane and equipment investment costs are high, and cost reduction is still needed for large-scale applications.
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